Electromagnetic and thermal evaluation of an applicator specialized to permit high‐resolution non‐perturbing optical evaluation of cells being irradiated in the W‐band |
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| Authors: | William F. Pickard Eduardo G. Moros Gal Shafirstein |
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| Affiliation: | 1. Department of Electrical and Systems Engineering, Washington University, Saint Louis, Missouri;2. Division of Radiation Physics and Informatics, Department of Radiation Oncology, College of Medicine, University of Arkansas for Medical Sciences, Little Rock, Arkansas;3. Department of Otolaryngology, College of Medicine, University of Arkansas for Medical Sciences, Little Rock, Arkansas |
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| Abstract: | To permit epi‐illuminated, high‐resolution optical microscopy of cells in monolayer culture during unperturbed W‐band (75–110 GHz) irradiation, a new class of applicator has been developed based upon WR10 rectangular waveguide components: the cells are normally plated onto the underside of a coverslip which is then placed against the under side of a waveguide flange and receives a roughly circular exposure pattern, with the ±1 dB central spot roughly 1 mm in diameter. Constructed and tested with 94 GHz millimeter waves, water‐immersion optics, and free‐convection cooling, the applicator works robustly and permits SARs at the cell layer as high as 4500 W/kg before the steady‐state temperature rise at the cell layer exceeds 0.5 K. Bioelectromagnetics 31:140–149, 2010. © 2009 Wiley‐Liss, Inc. |
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| Keywords: | 94 GHz applicator active denial system millimeter waves non‐perturbing simultaneous optical microscopy |
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