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Dry Etching Characteristics of 16-nm Amorphous Carbon Layer in a Dual-Frequency Plasma Etcher |
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| Authors: | Cheong Hee-Woon Kim Ji-Won Kim Kyungji Lee Hwally |
| Affiliation: | 1.Graduate School of Management of Technology, Hoseo University, 31499, Asan, Korea ;2.Samsung Electronics Co. Ltd., 18448, Hwaseong, Korea ;3.Department of Electrical and Computer Engineering, Seoul National University, 08826, Seoul, Korea ;4.Hyundai Motor Company, 18270, Hwaseong, Korea ; |
| Abstract: | Plasma Physics Reports - The etching characteristics of a patterned amorphous carbon layer (ACL) in a magnetized inductively coupled plasma (MICP) etcher were investigated. The etch rate and etched... |
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