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Endocytosis against high turgor pressure is made easier by partial coating and freely rotating base
Authors:Rui Ma  Julien Berro
Institution:1. Department of Physics, Xiamen University, Xiamen, China;2. Department of Molecular Biophysics and Biochemistry, Yale University, New Haven, Connecticut;3. Nanobiology Institute, Yale University, West Haven, Connecticut;4. Department of Cell Biology, Yale University School of Medicine, New Haven, Connecticut
Abstract:During clathrin-mediated endocytosis, a patch of flat plasma membrane is deformed into a vesicle. In walled cells, such as plants and fungi, the turgor pressure is high and pushes the membrane against the cell wall, thus hindering membrane internalization. In this work, we study how a patch of membrane is deformed against turgor pressure by force and by curvature-generating proteins. We show that a large amount of force is needed to merely start deforming the membrane and an even larger force is needed to pull a membrane tube. The magnitude of these forces strongly depends on how the base of the membrane is constrained and how the membrane is coated with curvature-generating proteins. In particular, these forces can be reduced by partially, but not fully, coating the membrane patch with curvature-generating proteins. Our theoretical results show excellent agreement with experimental data.
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