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Atomic Layer Deposited Aluminum Oxide for Interface Passivation of Cu2ZnSn(S,Se)4 Thin‐Film Solar Cells
Authors:Yun Seog Lee  Talia Gershon  Teodor K. Todorov  Wei Wang  Mark T. Winkler  Marinus Hopstaken  Oki Gunawan  Jeehwan Kim
Affiliation:1. IBM Thomas J. Watson Research Center, Yorktown Heights, NY, USA;2. Department of Mechanical Engineering, Department of Materials Science and Engineering, Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, MA, USA
Abstract:
Keywords:photovoltaic devices  semiconductors  solar cells  surface modification  thin films
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