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Leaf Water Diffusion Resistance in Clonal Tea (Camellia sinensis L.): Effects of Water Stress, Leaf Age and Clones
Authors:SANDANAM  S; GEE  G W; MAPA  R B
Institution:Tea Research Institute of Sri Lanka Talawakelle, Sri Lanka
Abstract:Leaf diffusion resistance was influenced by leaf age in well-wateredand water-stressed clonal tea plants. In well-watered plantsand in two of the three clones studied, young leaves showeda significantly lower diffusion resistance than old leaves.In water-stressed plants young leaves always exhibited a higherdiffusion resistance than old leaves. The highest diffusionresistance, irrespective of leaf age and water stress, occurredin clone DN which is known to be the most drought tolerant ofthe three clones studied, suggesting that drought tolerancein clone DN is caused, at least in part, by a stomatal regulationmechanism. Water release characteristic curves for the threeclones indicated differences in the water content-water potentialrelationship between young and old leaves as well as betweenclones. The drought tolerant clones had a higher relative watercontent for a given water potential compared with the drought-susceptibleclone. Camellia sinensis L., tea, diffussion resistance, water stress
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