Emergence and development of chlorhexidine resistance during sporulation of Bacillus subtilis 168 |
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| Authors: | L.A. Shaker B.N. Dancer A.D. Russell J.R. Furr |
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| Affiliation: | Welsh School of Pharmacy, University of Wales Institute of Science and Technology, Cardiff, U.K.;Department of Applied Biology, University of Wales Institute of Science and Technology, Cardiff, U.K. |
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| Abstract: | Abstract During sporulation of Bacillus subtilis strain 168 initiated by step-down conditions, resistance to chlorhexidine diacetate (CHA) developed at about t 3.5, before heat but after toluene resistance. Mutants blocked at stage IV of sporulation were sensitive to all three treatments. Stage V mutants were toluene resistant but moderately sensitive to heat and CHA. A stage VI mutant was resistant to all three treatments. Thus, chlorhexidine resistance is likely to be a result of spore coat, rather than of cortex, development. |
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| Keywords: | Chlorhexidine Resistance Sporulation Bacillus subtilis |
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