Plasmodium berghei K173: Selection of resistance to naphthoquine in a mouse model |
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Authors: | Hong Wang Zhu-Chun Bei Jing-Yan Wang Wu-Chun Cao |
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Affiliation: | aDepartment of Pharmacy, Beijing Institute of Microbiology and Epidemiology, State Key Laboratory of Pathogen and Biosecurity, 100071 Beijing, PR China;bDepartment of Epidemiology and Health Statistics, Beijing Institute of Microbiology and Epidemiology, State Key Laboratory of Pathogen and Biosecurity, 100071 Beijing, PR China |
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Abstract: | Naphthoquine (NQ), as a component of ARCO® which composed of NQ and artemisinin, is a new 4-aminoquinoline antimalarial synthesized by our institute. Here, a naphthoquine-resistant line of rodent malaria parasite was selected through exposing Plasmodium berghei Keyberg 173 strain to progressively increased drug pressure. The selected strain showed a more than 200-fold decreased susceptibility to NQ with a stable resistance phenotype after 10 serial passages without drug pressure or when cryopreserved over a period of 12 months. In a cross-resistance assay, the susceptibility of NQ-resistant parasites to chloroquine was decreased by 14.5-fold. These findings imply NQ-resistant parasites might be selected by long-term usage of NQ in epidemic areas and the efficacy of NQ or ARCO® in chloroquine-resistant Plasmodium falciparum epidemic areas should be monitored closely. |
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Keywords: | Plasmodium berghei Naphthoquine Drug resistance Cross-resistance |
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