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Plasmodium berghei K173: Selection of resistance to naphthoquine in a mouse model
Authors:Hong Wang  Zhu-Chun Bei  Jing-Yan Wang  Wu-Chun Cao
Affiliation:aDepartment of Pharmacy, Beijing Institute of Microbiology and Epidemiology, State Key Laboratory of Pathogen and Biosecurity, 100071 Beijing, PR China;bDepartment of Epidemiology and Health Statistics, Beijing Institute of Microbiology and Epidemiology, State Key Laboratory of Pathogen and Biosecurity, 100071 Beijing, PR China
Abstract:Naphthoquine (NQ), as a component of ARCO® which composed of NQ and artemisinin, is a new 4-aminoquinoline antimalarial synthesized by our institute. Here, a naphthoquine-resistant line of rodent malaria parasite was selected through exposing Plasmodium berghei Keyberg 173 strain to progressively increased drug pressure. The selected strain showed a more than 200-fold decreased susceptibility to NQ with a stable resistance phenotype after 10 serial passages without drug pressure or when cryopreserved over a period of 12 months. In a cross-resistance assay, the susceptibility of NQ-resistant parasites to chloroquine was decreased by 14.5-fold. These findings imply NQ-resistant parasites might be selected by long-term usage of NQ in epidemic areas and the efficacy of NQ or ARCO® in chloroquine-resistant Plasmodium falciparum epidemic areas should be monitored closely.
Keywords:Plasmodium berghei   Naphthoquine   Drug resistance   Cross-resistance
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