Kinetics of the stacking of ethidium bromide by the raman laser temperature-jump method |
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Authors: | Douglas H. Turner Raymond Yuan George W. Flynn Norman Sutin |
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Affiliation: | Departments of Chemistry, Brookhaven National Laboratory, Upton, New York 11973, USA;Columbia University, New York, New York 10027, USA |
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Abstract: | Raman laser temperature-jump measurements have been made on concentrated solutions of ethidium bromide. Two relaxations were observed. The faster has a lifetime of less than 30 ns and is attributed to rotation of the phenyl ring. The slower relaxation is concentration dependent and is due to the parallel stacking of two dye molecules. The forward and reverse rates for this process are (4.6 ± 1.4) × 108 M?1s?1 and (6.7 ± 1.4)× 106 s?1, respectively, at 25°C. 0.25 M ionic strength, and pH 6.9. This reverse rate and those of three similar reactions are found to fit a linear free energy plot. The implications of these results for studies of nucleic acid base stacking are discussed. |
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