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Plant Resistance Mechanisms to Air Pollutants: Rhythms in Ascorbic Acid Production During Growth Under Ozone Stress
Authors:Edward H. Lee
Affiliation: a Climate Stress Laboratory, USDA, ARS, Beltsville, Maryland, USA
Abstract:Relationships between ozone (O3) tolerance and leaf ascorbic acid concentrations in 03-susceptible (O3S) 'Hark' and O3-resistant (O3R) 'Hood'soybean, Glycine max (L.) Merr., cultivars were examined with high-performance liquid chromatography (HPLC). Leaf samples were analyzed at 4 h intervals during a 24 h period. Soybean cultivars grown in the greenhouse with charcoal filtered (CF) and nonfiltered (NF) air showed daily oscillations in ascorbic acid production. Highest ascorbic acid levels in leaves during light coincided with highest concentrations of photochemical oxidants in the atmosphere at 2:00 p.m. The resistant genotype produced more ascorbic acid in its trifoliate leaves than did the corresponding susceptible genotype. Under CF air (an O3-reduced environment) O3-S and O3-R cultivars showed rhythms in ascorbic acid production. In NF air (an O3 stress environment) the O3-R cultivar alone showed rhythms in ascorbic acid production. Results indicated that superior O3 tolerance in the Hood soybean cultivar (compared with Hark) was associated with a greater increase in endogenous levels of ascorbic acid. Ascorbic acid may scavenge free radicals and thereby protect cells from injury by O3 or other oxyradical products. Plants defend themselves against photochemical oxidant stress, such as O3, by several mechanisms. Experimental evidence indicates that antioxidant defense systems existing in plant tissues may function to protect cellular components from deleterious effects of photochemical oxidants through endogenous and exogenous controls.
Keywords:Antioxidant  Air pollution  Ascorbic acid  Circadian  Ozone  Photochemical oxidant  Resistance  Soybean
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