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Direct patterning of poly(acrylic acid) on polymer surfaces by ion beam lithography for the controlled adhesion of mammalian cells
Authors:In-Tae Hwang  Min-Suk Oh  Chan-Hee Jung  Jae-Hak Choi
Institution:1. Research Division for Industry and Environment, Advanced Radiation Technology Institute, Korea Atomic Energy Research Institute, Jeollabuk-do, Jeongeup-si, 580-185, Republic of Korea
2. POSCO Technical Research Laboratories, 699 Gumho-dong, Jeonnam, Gwangyang, 545-090, Republic of Korea
3. Department of Polymer Science and Engineering, Chungnam National University, Yuseong-gu, Daejeon, 305-764, Republic of Korea
Abstract:Poly(acrylic acid) (PAA)-patterned polystyrene (PS) substrates were prepared by ion beam lithography to control cell behaviors of mouse fibroblasts and human embryonic kidney cells. Thin PAA films spin-coated on non-biological PS substrates were selectively irradiated with energetic proton ions through a pattern mask. The irradiated substrates were developed with deionized water to generate negative-type PAA patterns. The surface characteristics of the resulting PAA-patterned PS surface, such as surface morphology, chemical structure and composition and wettability, were investigated. Well-defined 100 μm PAA patterns were effectively formed on relatively hydrophobic PS substrates by ion beam lithography at higher fluences than 5 × 1014 ions/cm2. Moreover, based on the in vitro cell culture test, cells were adhered and proliferated favorably onto hydrophilic PAA regions separated by hydrophobic PS regions on the PAA-patterned PS substrates, and thereby leading to the formation of well-defined cell patterns.
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