| Abstract: | A negative staining technique is presented based on the use of 40-60 nm quartz membrane supported by a silicon grid. The quartz membrane is fabricated by thermal growth of silicon dioxide on a silicon substrate followed by an anisotropic silicon etching step giving rectangular holes in the silicon substrate. The hydrophilic membrane is shown to be ideally suited for negative staining due to its spreading characteristics, homogeneity, heat resistance and mechanical stability. Micrographs of phage lambda are presented showing the detailed structure of the tail. A simple method of calculating the number of adsorbed particles based on diffusion limited association is also presented. |
