XPS evidence for the formation of Ni(II) complexes on treated activated carbon |
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Authors: | G. Mattogno R. Zanoni D. Giusto G. Russo L. Sisti |
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Affiliation: | Istituto di Chimica Generale ed Inorganica, Università di Roma, Rome, Italy;Istituto di Chimica ed Inorganica, Università di Milano, Centro di Studio per la Sintesi e la Struttura dei Composti dei Metalli di Transizione-C.N.R., Milan, Italy |
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Abstract: | X-ray photoelectron spectroscopy (XPS) was applied to a solid-state investigation on adsorbed systems obtained by contacting different samples of an activated carbon (Chemviron Filtrasorb 400) with solutions containing (a) 1,10-phenanthroline (phen); (b) NiCl2·6H2O. (c) Ni2+ ions and phen in a 1:3 molar ratio.XPS results on these systems are discussed with particular regard to the chemical state of the ligand (interaction of functional groups with the substrate) and of the metal ions on carbon (assessment of Ni oxidation state; detection of Ni complexes on carbon and information on their stoichiometries and structures). Various effects of successive chemical treatments on the above reported carbon species were also revealed by XPS, such as:(i) the formation of a ‘carbon–ligand’ system (activated carbon with ligand firmly present on it) after acid elution of the activated carbon treated with Ni–phen complexes in solution, and (ii) the adsorption of Ni2+ ions on this ‘carbon–ligand’ system, with fomation of Ni–phen complexes on carbon. |
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Keywords: | Author to whom correspondence should be addressed. |
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