Study of the plasma parameters in a high-current pulsed magnetron sputtering system |
| |
Authors: | A. N. Odivanova V. G. Podkovyrov N. S. Sochugov K. V. Oskomov |
| |
Affiliation: | 1.Institute of High-Current Electronics, Siberian Branch,Russian Academy of Sciences,Tomsk,Russia;2.Applied Electronics Ltd.,Tomsk,Russia |
| |
Abstract: | Results are presented from experimental studies of the current-voltage characteristics and spatial and temporal parameters of the plasma in a high-current pulsed magnetron sputtering system with a 10-cm-diameter plane disk cathode. It is shown that the plasma density in such a system is three orders of magnitude higher than that in conventional dc magnetron discharges and reaches 1013 cm−3 at a distance of 250 mm from the cathode at a peak discharge current of 500 A. The plasma propagates from the cathode region at a velocity of 1 cm/μs in the axial direction and 0.25 cm/μs in the radial direction. Optical emission spectroscopy shows that the degree of plasma ionization increases severalfold with increasing discharge current, mainly at the expense of the sputtered material. |
| |
Keywords: | |
本文献已被 SpringerLink 等数据库收录! |
|