Study of the plasma parameters in a high-current pulsed magnetron sputtering system

Results are presented from experimental studies of the current-voltage characteristics and spatial and temporal parameters of the plasma in a high-current pulsed magnetron sputtering system with a 10-cm-diameter plane disk cathode. It is shown that the plasma density in such a system is three orders of magnitude higher than that in conventional dc magnetron discharges and reaches 10¹³ cm⁻³ at a distance of 250 mm from the cathode at a peak discharge current of 500 A. The plasma propagates from the cathode region at a velocity of 1 cm/μs in the axial direction and 0.25 cm/μs in the radial direction. Optical emission spectroscopy shows that the degree of plasma ionization increases severalfold with increasing discharge current, mainly at the expense of the sputtered material.