High-Quality Plasmon Sensing with Excellent Intensity Contrast by Dual Narrow-Band Light Perfect absorbers |
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| Authors: | Xiaoshan Liu Guolan Fu Mulin Liu Guiqiang Liu Zhengqi Liu |
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| Affiliation: | 1.Jiangxi Key Laboratory of Nanomaterials and Sensors, Jiangxi Key Laboratory of Photoelectronics and Telecommunication, School of Physics, Communication and Electronics,Jiangxi Normal University,Nanchang,China |
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| Abstract: | A new strategy for realizing ultra-narrowband plasmonic absorber has been theoretically demonstrated. Dual-band perfect light absorber with the bandwidth down to single digit level and the maximal absorption exceeding 99.2 % is achieved. Moreover, novel absorber-based sensor platform with high-quality factors (S?>?420 nm/RIU, FOM?>?84, and FOM*?>?5600) are obtained. These features hold the proposed absorber to be a feasible candidate for applications in the sensing detection and notch filtering. |
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