Study of the stability of long-range-ordered lamellar structures for directed self-assembly lithography,performed using dissipative particle dynamics

We performed dissipative particle dynamics (DPD) simulations to obtain long-range-ordered lamellar structures for directed self-assembly lithography. The self-assembled structure of diblock copolymers (DBCs) depends on the length of the different blocks and the difference in their solubility parameters. In the DPD simulations, the DBCs were formed from coarse-grained particles, and the difference between the solubility parameters was represented by a repulsion parameter. We examined the phase separation morphology of the DBCs, which were confined using a trench model system. The repulsion parameter for the assembly of the lamellar structures from the DBC particles was chosen from six types of parameters. The orientation of the lamellar structure was controlled by the repulsion parameter that described the repulsion between the particles and the wall of the system. We changed the width of the trench, and examined the probability for the formation of the lamellar structure. The lamellar structure could not be obtained by increasing the width. To increase the probability, we placed a ridge at the centre of the bottom wall. It was found that the presence of the ridge increased the probability for the formation of the long-range-ordered lamellar structures.