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Effects of Water Stress on Cuticular Transpiration Rate and Amount and Composition of Epicuticular Wax in Seedlings of Six Oat Varieties
Authors:CURT BENGTSON  STIG LARSSON  CONNY LILJENBERG
Institution:Department of Plant Physiology, University of Göteborg, Carl Skottsbergs Gata 22, S-413 19 Göteborg, Sweden
Abstract:Six varieties of oat (Avena sativa L. cv. Stormogul II, Risto, Sol II, Selma, Sang and Pendek, arranged according to decreasing drought resistance) were cultivated under controlled conditions and exposed to water stress on 4 consecutive days. Seven-day-old seedlings were stressed by cooling the roots for 3 h to 1.0°C. During this treatment the leaf water potential decreased from -7 to -12 bars. Cuticular transpiration rate, total amount of epicuticular wax and amounts of some wax components (primary alcohols, alkanes, fatty acids) were determined. Unstressed seedlings of the most drought resistant variety (Stormogul II) showed the highest cuticular transpiration rate. After stress treatment the cuticular transpiration rate was most strongly reduced in this variety and at the same time it showed the largest increase in amount of epicuticular wax of the tested varieties. In Pendek and Sang, showing the least increase in epicuticular wax, the cuticular transpiration rate was only 5% lower after stress treatment. In all varieties the primary alcohol content of the epicuticular wax was slightly higher in stressed seedlings than in controls. Further, in Stormogul and Risto the content of the predominant alkanes was much lower in stressed seedlings than in controls. On the contrary, in Pendek the stressed seedlings showed a higher alkane content. In Stormogul II, Risto and Sol II the total amount of fatty acids was higher in stressed seedlings than in controls while the opposite was true in Sang. The relation between the epicuticular wax (amount and composition) and the cuticular transpiration rate is discussed as well as the possibility of using the tested parameters in a screening test for drought resistance.
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