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Silicon-containing carbene complexes 16. Intramolecular agostic stabilization versus nucleophilic addition to the 16-electron carbene complex (CO)4(L)W=C(NMe2)SiPh2Me
Authors:Ulrich Schubert  Matthias Schwarz
Affiliation:

Institut für Anorganische Chemie der Universität Würzburg, Am Hubland, D-97074 Würzburg Germany

Abstract:The 16-electron complex (CO)4W=C(NMe2)SiPh2Me (1) was photochemically prepared from (CO)5W=C- (NMe2)SiPh2Me. Reactions with selected nucleophiles, having different ligand properties, were performed to test the strength of the intramolecular agostic interaction of one of the phenyl groups, by which 1 is stabilized. The stable complexes cis-(CO)4LW=C(NMe2)SiPh2Me were formed with L=P(OMe)3, P(OEt)3 or 2,6-Me2C6H3NC. The substituted complexes had no tendency for ligand elimination. Addition of acetonitrile or pyridine to an ether solution of 1 resulted in the formation of cis-(CO)4(MeCN)W=C(NMe2)SiPh2Me or cis-(CO)4(C5H5N)- W=C(NMe2)SiPh2Me, respectively. These reactions were reversed on evaporation of the solutions. No reaction was observed with triethylamine.
Keywords:Tungsten complexes   Carbene complexes   Silyl complexes
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