Micro- and nanopatterning by lithographically controlled wetting |
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Authors: | Massimiliano Cavallini Denis Gentili Pierpaolo Greco Francesco Valle Fabio Biscarini |
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Institution: | 1] Consiglio Nazionale delle Ricerche, Istituto per lo Studio dei Materiali Nanostrutturati, Bologna, Italy. [2] Scriba Nanotecnologie, Bologna, Italy. |
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Abstract: | This protocol describes how to perform lithographically controlled wetting (LCW). LCW enables large-area patterning of microstructures and nanostructures of soluble materials, either organic or inorganic, including biological compounds in buffer solutions or compounds for cell guidance. LCW exploits the capillary forces of menisci established under the protrusions of a stamp placed in contact with a liquid film. In the space confined by each meniscus, the self-organization of the deposited solute yields highly ordered structures that replicate the motif of the stamp protrusions. The method does not require any particular infrastructure and can be accomplished by using simple tools such as compact discs or microscopy grids. Compared with other printing methods, LCW is universal for soluble materials, as it does not require chemical binding or other specific interactions between the solute and the surface. A process cycle takes from 2 to 36 h to be completed, depending on the choice of materials. |
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