Endodermal Silicon Deposits and Their Linear Distribution in Developing Roots of Sorghum bicolor (L.) Moench.

Seedlings of Sorghum bicolor (L.) Moench. were cultured in nutrientsolution containing 100 p.p.m. SiO₂. Over periods up to 14 days,the progressive accumulation of Si deposits was recorded bymeans of the electron-probe microanalyser and the scanning electronmicroscope along the seminal root length. An acropetal, linear gradient of Si deposits developed in theendodermis, beginning at the proximal end of the root after1 day, and subsequently extended distally until after 7 days,the total silicified endodermal zone occupied the proximal 75per cent of the root length, a value which remained relativelyconstant thereafter, in spite of root extension. No Si was detectedbelow this zone towards the apex. This result is believed tobe related directly to the asynchronous gradient of cell maturationexhibited by the endodermis behind the apex, and specificallyto the degree of wall development therein. Opaline silica was deposited only in the endodermis, initiallyon the inner tangential wall (ITW) surface after only 1 day,as spherical masses of coalesced, primary particles for whichthe term ‘silica aggregate’ is proposed. A thinlayer of silica over the wall surface was formed as a secondaryphase. The aggregates reached mature size after approximately7 days. Conditions favourable to the inception of silica depositionare discussed including the significance of the chemical compositionof the aggregates, and the importance of the degree of cellulosicthickening, as well as the surface characteristics, of the ITW.