首页 | 本学科首页   官方微博 | 高级检索  
   检索      


Collective influence of substrate chemistry with physiological fluid shear stress on human umbilical vein endothelial cells
Authors:Yan Li  Zhongjie Qin  Lin Zhou  Khawar Ali Shahzad  Delin Xia
Institution:1. School of Pharmacy, Taizhou Polytechnic College, Taizhou, China

Bone Tissue Engineering Research Center of Taizhou, Taizhou, China;2. Department of Oral and Maxillofacial Surgery, The Affiliated Stomatology Hospital of South-west Medical University, Luzhou, China;3. School of Pharmacy, Taizhou Polytechnic College, Taizhou, China

Abstract:In the treatment of cardiovascular diseases, vascular scaffold materials play an extremely important role. The appropriate substrate chemistries and 15 dynes/cm2 physiological fluid shear stress (FSS) are both required to ensure normal physiological activity of human umbilical vein endothelial cells (HUVECs). The present study reported the collective influence of substrate chemistries and FSS on HUVECs in the sense of its biological functions. The CH3, NH2, and OH functional groups were adopted to offer a variety of substrate chemistries on glass slides by the technology of self-assembled monolayers, whereas FSS was generated by a parallel-plate fluid flow system. Substrate chemistries on its own by no means had noticeable effects on eNOS, ATP, NO, and PGI2 expressions, while FSS stimuli enhanced their production. While substrate chemistries, as well as FSS, were both exerted, the releases of ATP, NO, and PGI2 were dependent on substrate chemistries. Study of F-actin organization and focal adhesions (FAs) formation of HUVECs before FSS exposure proves that F-action organization and FAs formation followed similar chemistry-dependence. Hereby proposed a feasible mechanism, that is, the F-actin organization and FAs formation of HUVECs are controlled by substrate chemistries, further advancing the modulation of FSS-triggered responses of HUVECs.
Keywords:cardiovascular diseases  fluid shear stress  HUVECs  self-assembled monolayer  substrate chemistries
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号