Quantitative analysis of sputtering due to ion beam bombardment of solids and biological specimens in high resolution electron microscopy |
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| Affiliation: | 1. Electrical Engineering Department, Kogakuin University, 1-24-2, Nishishinjuku, Shinjuku-ku, Tokyo, Japan;2. Hamamatsu University, School of Medicine 3600, Handa-cho, Hamamatsu city, Japan;3. Hitachi Naka Works, Ichige, Katsuta-city, Ibaragi-ken, Japan;1. School of Mechanical Engineering, Henan University of Engineering, Zhengzhou, 451191, PR China;2. Faculty of Engineering, Huanghe Science and Technology College, Zhengzhou, 450063, PR China;3. State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, PR China;1. Laboratorio de Señalización Celular y Nanobiología, Instituto de Investigaciones Biológicas Clemente Estable (IIBCE), Av. Italia, 3318, CP 11600 Montevideo, Uruguay;2. Plataforma de Microscopía de Fuerza Atómica, Instituto de Investigaciones Biológicas Clemente Estable (IIBCE), Av. Italia, 3318, CP 11600 Montevideo, Uruguay;1. ams-OSRAM AG, Unterpremstätten, Austria;2. FELMI, Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, Graz, Austria;1. deepXscan GmbH, Dresden, Germany;2. Faculty of Chemistry, University of Warsaw, Warsaw, Poland;3. Fraunhofer Institute for Ceramic Technologies and Systems, Dresden, Germany;4. Dresden Center for Nanoanalysis, Center for Advancing Electronics Dresden, Technische Universität Dresden, Dresden, Germany;5. Helmholtz-Zentrum Berlin, Berlin, Germany;6. Institut für Physik, Humboldt-Universität zu Berlin, Berlin, Germany;7. Interface Science Department, Fritz Haber Institute of Max Planck Society, Berlin, Germany;1. Laboratory for Future Interdisciplinary Research of Science and Technology, Tokyo Institute of Technology, 2-12-1, Ookayama, Meguro-ku, Tokyo, 152-8552, Japan;2. Institute of Applied Physics, Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba, Ibaraki, 305-8573, Japan;3. School of Environmental Science and Engineering, Kochi University of Technology, 185 Miyanokuchi, Tosayamada, Kami City, Kochi, 782-8502, Japan |
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| Abstract: | When a positively charged ion beam is used to bombard a solid target, most of the atoms are displaced and sputtered according to the atomic sputtering theory. In the case of biological specimens, most of the bond-breaking molecules in proteins are removed, when based on the molecular sputtering theory. It was found that the thinning rate for solids and the etching rate for biological specimens, when prepared by a normal double fixation and staining method, can be measured from the sputtering yield and density of the specimens. It was also found that the thinning and etching rates depend on the removal weight per sublimation energy and bonding energy, respectively. The angular distribution of sputtering yield, its dependence on incident angle and the secondary electron emission yield were measured, and the optimum etching condition of the incidence was obtained. Experiments showed that the in situ observation of intracellular structures of biological specimens prepared by ion beam etching can be a very effective method in electron microscopy. |
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