首页 | 本学科首页   官方微博 | 高级检索  
   检索      


Mapping QTL controlling maize deep-seeding tolerance-related traits and confirmation of a major QTL for mesocotyl length
Authors:Hongwei?Zhang  Pan?Ma  Zhengnan?Zhao  Guangwu?Zhao  Baohua?Tian  Jianhua?Wang  Email author" target="_blank">Guoying?WangEmail author
Institution:(1) State Key Laboratory of Agrobiotechnology and National Center for Plant Gene Research (Beijing), China Agricultural University, Beijing, 100193, China;(2) Present address: School of Agriculture and Food Science, ZheJiang A&F University, HangZhou, 311300, China;(3) Institute of Crop Sciences, Chinese Academy of Agricultural Sciences, Beijing, 100081, China
Abstract:Deep-seeding tolerant seeds can emerge from deep soil where the moisture is suitable for seed germination. Breeding deep-seeding tolerant cultivars is becoming increasingly important in arid and semi-arid regions. To dissect the quantitative trait loci (QTL) controlling deep-seeding tolerance traits, we selected a tolerant maize inbred line 3681-4 and crossed it with the elite inbred line-X178 to generate an F2 population and the derivative F2:3 families. A molecular linkage map composed of 179 molecular markers was constructed, and 25 QTL were detected including 10 QTL for sowing at 10 cm depth and 15 QTL for sowing at 20 cm depth. The QTL analysis results confirmed that deep-seeding tolerance was mainly caused by mesocotyl elongation and also revealed considerable overlap among QTL for different traits. To confirm a major QTL on chromosome 10 for mesocotyl length measured at 20 cm depth, we selected and self-pollinated a BC3F2 plant that was heterozygous at the markers around the target QTL and homozygous at other QTL to generate a BC3F3 population. We found that this QTL explained more phenotypic variance in the BC3F3 population than that in the F2 population, which laid the foundation for fine mapping and NIL (near-isogenic line) construction.
Keywords:
本文献已被 PubMed SpringerLink 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号