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Laser photolysis of carboxymethylated chitin derivatives in aqueous solution. Part 2. Reaction of OH* and SO4*- radicals with carboxymethylated chitin derivatives
Authors:Zhai Maolin  Kudoh Hisaaki  Wach Radoslaw A  Wu Guozhong  Lin Mingzhang  Muroya Yusa  Katsumura Yosuke  Zhao Long  Nagasawa Naotsugu  Yoshii Fumio
Affiliation:Nuclear Engineering Research Laboratory, School of Engineering, University of Tokyo, Shirakata-Shirane 2-22, Tokai-mura, Naka-gun, Ibaraki-ken, 319-1188 Japan. mlzhai@chem.pku.edu.cn
Abstract:The reactions of OH* or SO4*- radicals with carboxymethyl chitin (CM-chitin) and its deacetylated product, carboxymethyl chitosan (CM-chitosan), were investigated in aqueous solutions using a laser photolysis technique. The rate constants of the reactions of OH* and SO4*- radicals with CM-chitosan are always higher than those for CM-chitin, indicating that the amino-group could increase the reactivity of carboxymethylated chitin derivatives. The rate of the reactions of CM-chitin and CM-chitosan with OH* radical was found to decrease at lower pH when polymers chains tend to the coiled conformation. In comparison, the rate constant of the reaction of SO4*- radicals with CM-chitin or CM-chitosan decreased with pH, indicating that CM-chitin or CM-chitosan has a higher reactivity with the SO4*- radical at low pH due to the protonation of the amino group.
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