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The parameters of the magnetron plasma at distances several times larger than the cathode diameter were measured. The plasma
temperature and density measured by the probe technique were found to be 1.4 eV and 6 × 1010 cm−3, respectively. The dependences of the plasma density and temperature on the argon flow rate in the course of TiAlN coating
deposition were determined. Before deposition of the coating, the substrate was cleaned by ion sputtering at substrate bias
voltages higher than 200 V. 相似文献
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