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Plasma Physics Reports - The etching characteristics of a patterned amorphous carbon layer (ACL) in a magnetized inductively coupled plasma (MICP) etcher were investigated. The etch rate and etched... 相似文献
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Hee-Woon Cheong Lee Woohyun Kim Ji-Won Cha Sujin Kim Kyoungji Lee Hwally 《Plasma Physics Reports》2020,46(3):328-335
Plasma Physics Reports - Non-uniformities in the plasma parameters in a magnetized inductively coupled plasma (M-ICP) etcher were investigated. Further in text of this article the silicon dioxide... 相似文献
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