Ribbon electron beam formation by a forevacuum plasma electron source

Results of the numerical analysis and experimental research on ribbon electron beam generation based on hollow cathode discharge at forevacuum gas pressure are presented. Geometry of the accelerating gap has modified. It lets us focus the ribbon electron beam and to transport it on a distance of several tens of centimeters in the absence of an axial magnetic field. The results of numerical simulations are confirmed by the experiment.     

Anodization of aluminum and silicon in plasma of a non-self-sustained glow discharge

The results of anodization of aluminum and silicon in an oxygen plasma are presented. The plasma was generated by a non-self-sustained glow discharge with a hollow cathode excited by an electron beam at the oxygen pressure of 20 Pa. The density of the current flowing through the anodized specimen did not exceed 1.5 mA/cm², and its temperature was 200–250°C. Continuous Al₂O₃ and SiO₂ films were formed on the aluminum and silicon surfaces. The growth rate of the oxide layers was 150–200 nm/h for Al₂O₃ and 400–800 nm/h for SiO₂.