Genetic and Molecular Characteristics of X-Ray-Sensitive Mutants of Escherichia coli Defective in Repair Synthesis

Alleles responsible for X-ray-sensitive characteristics of three mutants of Escherichia coli B, which were also sensitive to ultraviolet (UV) irradiation, were mapped near metE locus, and named res-1, res-2, and res-3. All the res(-) mutants showed no host cell reactivability (Hcr(-)) for transducing deoxyribonucleic acid (DNA) of P1 phage irradiated by UV but they were Hcr(+) for infective DNA of P1 phage. Furthermore, they showed no detectable activity of DNA polymerase. Characteristics of allele res-1 were studied in detail. The mutant res-1 uvr(+) showed an extensive degradation of DNA after UV irradiation. Double mutants carrying res-1 uvrA(-), res-1 uvrB(-), and res-1 uvrC(-) showed no marked increase in UV sensitivity beyond that of the uvr(-) single mutants and only negligible UV-induced DNA degradation. The uvr(-) mutations showed no such suppressive effect on DNA degradation induced by X rays in these double mutants. It is concluded that res(-) mutants are defective in the second step (repair synthesis) of the excision repair process and that DNA polymerase is partly responsible for the assumed resynthesis step.     

Effect of Thymine Starvation on Deoxyribonucleic Acid Repair Systems of Escherichia coli K-12

Thymine starvation of Escherichia coli K-12 results in greatly increased sensitivity to ultraviolet light (UV). Our studies, using isogenic strains carrying rec and uvr mutations, have shown the following. (i) Common to all strains tested is a change from multihit to single-hit kinetics of survival to UV after 60 min of thymine starvation. However, the limiting slope of UV survival curves decreases in the rec(+)uvr(+) strain and changes very little in several rec mutant strains and one uvrB mutant strain. Thus, when either the rec or uvr system is functioning alone, the limiting slopes of the UV survival curves are relatively unaffected by thymine starvation. (ii) Thymine starvation does not significantly inhibit repair processes carried out by either repair system alone; i.e., host cell reactivation of irradiated phage (carried out by the uvr system), excision of thymine dimers (uvr), or X-ray repair (rec). (iii) In a rec(+)uvr(+) strain, repair appears to be a synergistic rather than additive function of the two systems. However, after thymine starvation, repair capacity is reduced to about the sum of the repair capacities of the independent systems. (iv) The kinetics of thymineless death are not changed by rec and uvr mutations. This indicates that the lesions responsible for thymineless death are not repaired by rec or uvr systems. (v) Withholding thymine from thy rec(+)uvr(+) bacteria not undergoing thymineless death has no effect on UV sensitivity. Under these conditions one sees higher than normal UV resistance in the presence or absence of thymine. This is due to increased repair carried out by the uvr system. To explain these results we postulate that thymine starvation does not inhibit either the rec or uvr repair pathway directly. Rather it appears that thymine starvation results in increased UV sensitivity in part by inhibiting a function which normally carries out efficient coordination of rec and uvr pathways.     

Repair-defective mutants of Alteromonas espejiana, the host for bacteriophage PM2

The in vivo repair processes of Alteromonas espejiana, the host for bacteriophage PM2, were characterized, and UV- and methyl methanesulfonate (MMS)-sensitive mutants were isolated. Wild-type A. espejiana cells were capable of photoreactivation, excision, recombination, and inducible repair. There was no detectable pyrimidine dimer-DNA N-glycosylase activity, and pyrimidine dimer removal appeared to occur by a pathway analogous to the Escherichia coli Uvr pathway. The UV- and MMS-sensitive mutants of A. espejiana included three groups, each containing at least one mutation involved with excision, recombination, or inducible repair. One group that was UV sensitive but not sensitive to MMS or X rays showed a decreased ability to excise pyrimidine dimers. Mutants in this group were also sensitive to psoralen plus near-UV light and were phenotypically analogous to the E. coli uvr mutants. A second group was UV and MMS sensitive but not sensitive to X rays and appeared to contain mutations in a gene(s) involved in recombination repair. These recombination-deficient mutants differed from the E. coli rec mutants, which are MMS and X-ray sensitive. The third group of A. espejiana mutants was sensitive to UV, MMS, and X rays. These mutants were recombination deficient, lacked inducible repair, and were phenotypically similar to E. coli recA mutants.     

Repair of nitrous acid damage to DNA in Escherichia coli.

A number of mutant strains of Escherichia coli have been examined for their sensitivity to nitrous acid and in some instances to methylmethanesulfonate. All ung- mutants tested are abnormally sensitive to nitrous acid. Since the ung mutation is phenotypically expressed as a defect in uracil DNA glycosidase, this observation supports the contention that treatment of cells with nitrous acid causes deamination of cytosine to uracil. In addition the observed sentitivity indicates that the ung gene is involved in the repair of uracil in DNA. Studies with other mutants suggest that both exonuclease III and DNA polymerase I of E. coli are involved in the repair of nitrous acid damage in vivo.     

Specifically UV-sensitive photoreactivable mutant of Salmonella abony

A new type of UV-sensitive mutant was isolated in Salmonella abony. The war 12 mutation causing UV sensitivity did not affect photoreactivability of UV damage or sensitivity to γ-rays, methyl methanesulfonate (MMS), mitomycin (MC) or 4-nitro-quinoline I-oxide (4NQO).Mutation uvr I2 appeared to be near the uvr B gene of Salmonella: the frequencies of contransduction of uvr B2 and uvr I2 mutations with gal were found to be 3% and 6% respectively.Close localization of the uvr I2 and uvr B2 mutations, the possibility of recombination between them and their phenotypic differences (both uvr B2 and uvr I2 mutants show quantitatively different Hcr phenotypes and different sensitivities to MC and 4NQO) suggest that the uvr B2 and uvr I2 mutations might be localized in different cistrons of an operon controlling the first step of excision repair.     

Loss and restoration of viability of E. coli due to combinations of mutations affecting DNA polymerase I and repair activities

Summary We have found that the cells possessing the polA6 mutation affecting DNA polymerase I are unable to accept another mutation (uvr502) leading to UV-sensitivity. The introduction of the polA12 mutation determining the synthesis of a temperature sensitive DNA polymerase I into the uvr502 mutant results in the temperature sensitivity of colony forming ability of the double mutant. These data show that the uvr502 derivatives lacking DNA polymerase I are inviable. Reversions to temperature resistance in the population of the double mutant uvr502 polA12 may occur because of reverse mutations at one of the mutated sites or because of mutations suppressing DNA polymerase I deficiency but not UV- or MMS-sensitivity of revertants. DNA and protein synthesis in uvr502 polA12 cells continues after a shift to 45°C with rates almost indistinguishable from those in single mutants or wild type cells. No differences in DNA degradation were observed during incubation of single and double mutants at 45°C. The single strand molecular weight distribution of parent DNA from the double mutant as well as that from wild type cells is not affected by the shift to 45°C and 3 hours incubation at this temperature. We suggest that DNA polymerase I and/or the product altered by the uvr502 mutation are required for some step(s) of discontinuous DNA replication nonessential for the formation of acid insoluble DNA. The DNA polymerase I and the uvr gene product seem to be able to substitute for each other in accomplishing this process.     

RAD29 and RAD31--new genes from Saccharomyces cerevisiae yeasts, participating in control of DNA repair. Isolation and genetic study of mutants

Base excision repair (BER) and nucleotide excision repair (NER) are two main cellular responses to DNA damage induced by various physical and chemical factors. After exposure of the strain that carries the NER-blocking rad2 mutation to UV light, several mutants hypersensitive to the UV light lethal action and simultaneously sensitive to methylmethanesulphonate (MMS) were isolated. Two of these mutants (Uvs64 and Uvs212) were examined in detail. The mutants were found to carry recessive, monogenically inherited lesions that had pleiotropic, though different, phenotypes: both mutants were also sensitive to nitrous acid (HNO2), whereas Uvs212 was sensitive to hydrogen peroxide as well. Moreover, the homozygote for the uvs212 mutation, but not for uvs64, blocks the sporulation. Since the mutations examined were not allelic to any of the known rad mutations that cause MMS sensitivity or to each other, it is concluded that two new genes involved in the control of yeast DNA repair were detected. Furthermore, these genes were mapped to different regions of the right arm of chromosome 2 where repair genes were not found. Thus, two new genes, designated RAD29(UVS64) and RAD31(UVS212) and probably involved in base excision repair, were identified.     

Lethal and mutagenic action of hydrogen peroxide on Haemophilus influenzae.

The lethal and mutagenic effects of H2O2 on wild-type Haemophilus influenzae Rd and on uvr1, uvr2, rec1, and rec2 mutant strains were studied. The first two mutants are sensitive to UV, and the second two are defective in recombination. Rd, urv1, and rec1 strains were more sensitive to the killing effect of H2O2 treatment than were uvr2 and rec2 strains. There were peaks of mutagenesis at two H2O2 concentrations over a range of 30 to 275 mM. Our results suggest a specific repair of H2O2 damage that is independent of the Uvr2 and Rec2 gene products. Sensitivity to the killing effect of H2O2 and to the lethal action of near-UV light were similar for Rd and uvr1 strains. This finding suggests that the mechanisms of killing by and repair of H2O2 damage may have some overlap with those of near-UV radiation.     

Sensitivity to methylmethanesulfonate and nitrous acid of ultraviolet light-sensitive mutants in Saccharomyces cerevisiae

Summary Twenty two ultraviolet light-sensitive mutants isolated byParry andCox (1968) were tested for a possible cross-sensitivity to nitrous acid and methylmethanesulfonate. Eighteen of these mutants showed, in comparison to wild type, an increased sensitivity to methylmethanesulfonate and 16 mutants were cross-sensitive to nitrous acid. Cross-sensitivity between these two chemicals was good even when the degrees of sensitivity were compared; only two major exceptions were found. The degree of sensitivity to the two chemicals on one side and to ultraviolet light was not always the same. Two mutants of extreme sensitivity to chemicals were only weakly sensitive to ultraviolet light whereas in another mutant an extreme sensitivity to ultraviolet light was combined with a low sensitivity to chemicals. These observations are discussed in the light of current views on excision repair models.     

Dark-Recovery Processes in Escherichia coli Irradiated with Ultraviolet Light III. Effect of rec Mutations on Recovery of Excision-Deficient Mutants of Escherichia coli K-12

Mutants of Escherichia coli K-12 unable to excise pyrimidine dimers from their deoxyribonucleic acid (DNA) because of a uvr mutation show a higher survival when plated on a minimal salts medium after exposure to ultraviolet radiation than when plated on a complex medium such as nutrient agar containing yeast extract. This response has been called minimal medium recovery (MMR). Recovery of uvr mutants can take place in liquid as well as on solid medium, but not in buffer or under conditions of amino acid starvation that do not permit cell growth and normal DNA replication. MMR can thus be distinguished from the recovery of recombination-deficient (rec(-)uvr(+)) derivatives of K-12 which can occur under conditions where growth is not possible. Because MMR is characteristic of excision-defective mutants, it evidently reflects a type of repair independent of excision. We have obtained genetic evidence that MMR is determined by the rec genes, which also control recombination in K-12. Cells carrying a uvr mutation together with recA13, recA56, recB21, or recC22 failed to show MMR and were more sensitive to ultraviolet radiation than either their rec(+)uvr(-) or rec(-)uvr(+) parents. The rec(+)uvr(-) derivatives obtained from recA uvr(-) strains by transduction or by reversion regained the capacity for MMR. Our results indicate that inactivation of any one of the three genes, recA, recB, or recC, prevents cells from showing MMR.     

Ultraviolet-sensitive Targets in the Enzyme-synthesizing Apparatus of Escherichia coli

Inhibition by ultraviolet light of beta-galactosidase and alkaline phosphatase synthesis was investigated in both ultraviolet (UV)-sensitive and UV-resistant (wild-type) Escherichia coli, with the objective of determining the sensitivity of various targets. Kinetics of enzyme formation by unmated bacteria and in mating systems, in which the donor provided the specific genetic material and the recipient the cytoplasm, permit the following conclusions regarding the sensitivity of various targets. Catabolite repression resulting from UV damage causes most of the inhibition of beta-galactosidase formation. When it is largely eliminated by a step-down in nutrition, the principal target in UV-sensitive bacteria appears to be the structural gene (lacZ(+)), but damage to the cytoplasm is also important. Transitory inhibition by inactivation of messenger ribonucleic acid is also observed. In wild-type bacteria, repair reduces the importance of lesions in deoxyribonucleic acid sufficiently that cytoplasmic damage appears to be at least as important. Repair occurs within 10 min, as shown by recovery of enzyme-synthesizing ability. Caffeine and proflavine prevent recovery. Newly mated bacteria respond to irradiation very differently than do unmated bacteria. The beta-galactosidase or alkaline phosphatase structural gene (lacZ(+) or phoP(+)) is much more inhibited after it is transferred than it is in unmated bacteria. This sensitivity seems to depend on a sensitive state of the injected material, rather than on a different physiological condition of the entire zygote. Irradiation of recipient uvr(+) bacteria much more strongly inhibited expression of injected genes than if the F(-) was uvr(s). Studies on mating systems are not very useful for learning about the function of unmated bacteria.     

Saccharomyces cerevisiae mutants with enhanced induced mutation and altered mitotic gene conversion

We have developed a method to isolate yeast (Saccharomyces cerevisiae) mutants with enhanced induced mutagenesis based on nitrous acid-induced reversion of the ade2-42 allele. Six mutants have been isolated and designated him (high induced mutagenesis), and 4 of them were studied in more detail. The him mutants displayed enhanced reversion of the ade2-42 allele, either spontaneous or induced by nitrous acid, UV light, and the base analog 6-N-hydroxylaminopurine, but not by gamma-irradiation. It is worth noting that the him mutants turned out not to be sensitive to the lethal effects of the mutagens used. The enhancement in mutation induced by nitrous acid, UV light, and 6-N-hydroxylaminopurine has been confirmed in a forward-mutation assay (induction of mutations in the ADE1, ADE2 genes). The latter agent revealed the most apparent differences between the him mutants and the wild-type strain and was, therefore, chosen for the genetic analysis of mutants, him mutations analyzed behaved as a single Mendelian trait; complementation tests indicated 3 complementation groups (HIM1, HIM2, and HIM3), each containing 1 mutant allele. Uracil-DNA glycosylase activity was determined in crude cell extracts, and no significant differences between the wild-type and him strains were detected. Spontaneous mitotic gene conversion at the ADE2 locus is altered in him1 strains, either increased or decreased, depending on the particular heteroallelic combination. Genetic evidence strongly suggests him mutations to be involved in a process of mismatch correction of molecular heteroduplexes.     

Toxicity of L-Tryptophan photoproduct on recombinationless (rec) mutants of Salmonella typhimurium

l-Tryptophan after exposure to black light becomes toxic for recombinationless (rec) mutants of Salmonella typhimurium. Fifty-six radiation-sensitive mutants were screened for sensitivity to the tryptophan photoproduct; the rec and exr (X-ray sensitive) mutants are sensitive, whereas the uvr, hcr, and wild-type strains are resistant. A number of catabolic products of tryptophan and compounds related to tryptophan were screened for toxicity to rec strain; these are nontoxic or far less toxic for rec strains than irradiated l-tryptophan. The toxic photoproduct is relatively stable to drying and basic hydrolysis at 90 C, indicating that it is a stable organic compound, eliminating peroxide as the toxic component. It was also observed that the toxic product is a photooxidation product since it is formed only when l-tryptophan is irradiated in the presence of air.     

Photochemistry and photobiology of 5-azacytidine: effect of repair on photostabilization of Escherichia coli.

The photochemical stability of the anomalous nucleic acid base 5-azacytidine (z5Cyd) on irradiation at 254 nm is by about one order of magnitude less than that of cytidine (Cyd). Contrary to the photochemical behaviour, incorporation of z5Cyd into the nucleic acids of E. coli strains SR 20 (uvr+ rec+), SR 74 (uvr+ rec-) and SR 22 (uvr- rec+) produced a higher resistance to UV light. Only the SR 73 (uvr- rec-) strain was shown to have an increased UV sensitivity. This latter finding is in accord with the photochemical properties of z5Cyd. The results led to the conclusion that excision and recombination repair processes contribute to the observable protective effect. The fact that inhibition of excission repair by caffeine or proflavine of the mutant uvr+ rec- changes protection into sensitization supports this idea.     

Strain improvement of Aspergillus niger for enhanced lipase production

The enhancement of lipase production from Aspergillus niger was attempted by ultraviolet (UV) and nitrous acid mutagenesis, and the mutants were selected on media containing bile salts. Nitrous acid mutants exhibited increased efficiency for lipase production when compared with UV mutants in submerged fermentation. The hyperproducing UV and nitrous acid mutants were further subjected to a second step of mutagenesis to devise an economical and ecofriendly technique for lipase production by the effective use of hydrocarbons. One percent kerosene was found to be optimal for lipase production, and one of the mutant strains NAII exhibited 2.53 times more increased lipase activity than the parental strain did. This investigation indicates a possible role for the A. niger mutant strains in the biodegradation of oil-polluted environments for the development of ecofriendly technologies.     

Cross-resistance relationships in Escherichia coli between ultraviolet radiation and nitrous acid

Zampieri, Antonio (Palo Alto Medical Research Foundation, Palo Alto, Calif.), and Joseph Greenberg. Cross-resistance relationships in Escherichia coli between ultraviolet radiation and nitrous acid. J. Bacteriol. 87:1094-1099. 1964.-A number of radiosensitive and radioresistant strains of Escherichia coli were tested for sensitivity to injury by nitrous acid. All the radioresistant strains, including 13 radioresistant mutants of strain S, B/r, Bpr5, and K-12, were found to be significantly more resistant to nitrous acid than were the radiosensitive strains S and B. The radioresistant mutants of strain S, Bpr5, and K-12 displayed similar responses to nitrous acid and were less resistant than was strain B/r. Strains B and S were indistinguishable on the basis of nitrous acid sensitivity. The survival curves of all strains examined were similar in shape to corresponding survival curves after ultraviolet radiation. The sensitivity to nitrous acid of the radiosensitive strains S and B, but not that of the radioresistant strains, was found to be greater on Tryptone medium than on Penassay medium, and greater on Penassay medium than on glucose-salts medium. Between 2 and 3% of the strain S survivors of nitrous acid treatment were radioresistant; 46 such radioresistant mutants were isolated and found to be identical in cross-resistance pattern with radioresistant types (R(3), R(4), or R(6)) previously described. The proportions in which these radioresistant types were found to occur were similar to those observed after selection by other radiomimetic agents.     

Strain improvement of Aspergillus niger for the enhanced production of asperenone

The enhancement of production of asperenone (Fig. 1), an inhibitor of lipoxygenase and human platelet aggregation from Aspergillus niger CFTRI 1105, was achieved by UV and nitrous acid mutagenesis. Nitrous acid mutants exhibited increased inhibitor production when compared with UV irradiated mutants. I N 41 a first-generation nitrous acid mutant produced 5.1 fold increased asperenone over parent strain. Mutant II N 31 obtained by second-generation nitrous acid treatment produced 60.3 mg asperenone/g biomass, which was 131 fold increase when compared to first generated mutant I N 41 and 670 fold increase over the parent strain. This mutant was stable for several generations on production medium.     

The properties of UV sensitive mutants of Escherichia coli K12 which are also refractory to colicin E2

Summary Among mutants refractory to colicin E2 at low temperatures but sensitive at high temperatures (designated Ref-II), three strains are described which are also UV sensitive. Although colicin refractivity is temperature dependent UV sensitivity is expressed at all temperatures. Although the UV sensitive lesion appears to be similar in its effects to that in Rec (recombinationless) strains, mutants specifically isolated as Rec strains are in fact more sensitive to E2 than are wild type strains. It is suggested that E2 refractivity and UV sensitivity in the mutants probably reflects the phenotypic expression of distinct although linked genes. It is also suggested that the degradation of DNA stimulated by adsorption of E2 to wild type bacteria may be caused by the same enzyme(s) which causes enhanced breakdown of DNA in some rec ^– mutants after UV irradiation.     

Dark Recovery Processes in Escherichia coli Irradiated with Ultraviolet Light I. Effect of rec− Mutations on Liquid Holding Recovery

We have examined various derivatives of Escherichia coli K-12 for liquid holding recovery, a type of recovery originally observed in E. coli B irradiated with ultraviolet light. Although most of the K-12 derivatives tested showed relatively little or no recovery under our conditions, four of the six independent rec(-) mutants examined, those carrying recA1, rec-12, recA13, and rec-56, respectively, displayed marked recovery. These mutants are distinguished from rec(+) strains by their increased sensitivity to ultraviolet radiation and decreased ability to undergo genetic recombination. Two of them have also been reported to release large amounts of their deoxyribonucleic acid as acid-soluble material, especially after irradiation. None of the three uvr(-) mutants examined, containing uvrA6, uvrB5, or uvrC34, showed comparable liquid holding recovery. The one rec(-) uvr(-) derivative tested, carrying recA13 and uvrA6, did not appear to undergo liquid holding recovery, although recA13 uvr(+) strains did. Genetic analysis of one strain, a recA13 mutant, indicated that all the rec(+) derivatives obtained from it by conjugation, transduction and reversion, had lost the property of showing liquid holding recovery. From these results, we conclude that in E. coli K-12 the expression of liquid holding recovery depends upon certain rec(-) mutations.     

The mutator property of uvr502 mutation affecting UV sensitivity of Escherichia coli

Summary The frequency of direct and reverse mutations at several chromosomal loci increased in UV sensitiveuvr502 strains ofE. coli. Both UV sensitivity and mutator (Mut⁻) phenotype are due to the singleuvr502 mutation. Inuvr ⁺/uvr502 merodiploid the Mut⁻ phenotype is recessive.