| Abstract: | When Aspergillus ochraceus NRRL 3174 was grown under controlled atmospheres with 1 and 5% O2 and without CO2, the amount of ochratoxin produced was the same as that produced by the control colonies. Increasing the O2 level up to 40% reduced ochratoxin production by 75%, whereas at 60% O2, ochratoxin production was enhanced. In atmospheres enriched with 10 or 20% CO2, ochratoxin production was reduced when O2 concentrations were below 20% and enhanced when the O2 concentration was 40 or 60% O2. Ochratoxin production was completely inhibited at 30% CO2 and above, regardless of the O2 level. Colony growth was partially inhibited at 60% CO2, and no growth occurred at 80% CO2 or above. However, when colonies inhibited by 60% CO2 or above were subsequently exposed to air, radial growth, number of sclerotia formed, and the amount of ochratoxin produced were the same as in the control colonies. The results indicate that A. ochraceus is tolerant to CO2 concentrations higher than those required to control storage insects. |
