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Ion currents involved in early Nod factor response in Medicago sativa root hairs: a discontinuous single-electrode voltage-clamp study
Authors:Kurkdjian A  Bouteau F  Pennarun A M  Convert M  Cornel D  Rona J P  Bousquet U
Institution:Institut des Sciences Végétales, Centre National de la Recherche Scientifique, Bât 22, Avenue de la Terrasse, 91198 Gif-sur-Yvette Cedex, France, and;UniversitéParis 7, Electrophysiologie des Membranes LPCMSP, CASE 7069, Tour 54–64, 2 place Jussieu, 75251 Paris Cedex 05, France
Abstract:Nod factor NodRm-IV(Ac,S)], isolated from the bacterium Rhizobium meliloti, induces a well-known depolarization in Medicago sativa (cv Sitel) root hairs. Analysis of this membrane response using the discontinuous single-electrode voltage-clamp technique (dSEVC) shows that anion channel, K+ channel and H+-ATPase pump currents are involved in young growing root hairs. The early Nod-factor-induced depolarization is due to increase of the inward ion current and inhibition of the H+ pump. It involved an instantaneous inward anion current (IIAC) and/or a time-dependent inward K+ current (IRKC). These two ion currents are then down-regulated while the H+ pump is stimulated, allowing long-term rectification of the membrane potential (Em). Our results support the idea that the regulation of inward current plays a primary role in the Nod-factor-induced electrical response, the nature of the ions carried by these currents depending on the activated anion and/or K+ channels at the plasma membrane.
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