高产生物表面活性剂菌株的紫外诱变选育

从新疆塔里木河边的土壤中筛选出1株产表面活性剂的菌株BIT-TLM1,该菌在以葡萄糖为碳源的无机盐培养基中,在150 r/min、40℃的条件下培养20 h,发酵液的表、界面张力分别降至29.29和0.61 mN/m。以菌株BIT-TLM1为原始菌株,对该菌进行紫外线诱变,选育出1株高产表面活性剂的诱变菌株UV-10,其产生表面活性剂的量达到0.309 7 g/g菌体,比原始菌株提高了9.22%,UV-10有较好的遗传稳定性,UV-10产表面活性剂的最佳培养条件:碳源为葡萄糖、氮源为NH4Cl、pH8.0和2%的盐度。

Breeding of High Surfactant-Producing Strain by UV Mutagenesis

One bio-surfactant-producing strain BIT-TLM1 was isolated from samples collected from soil of river bank of Tarim.Surface tension and interfacial tension of the fermented broth were reduced to 29.29 mN/m and 0.61 mN/m after cultured 20 h in medium containing glucose as carbon source and inorganic salt with 150 r/min,40 ℃.The BIT-TLM1 strain was mutagenized with UV,and bred out a surfactant high-yielding genetically stable mutant strain UV-10.The yield of the surfactants was as much as 0.309 7 g/g thallus,increased by 9.22 % as compared with the original one under the same conditions.The results showed that the optimal culture conditions for the strain UV-10 were glucose as carbon source,NH4Cl as nitrogen source,pH at 8.0 and salinity concentration at 2%.