| Abstract: | Plants of Phaseolus vulgaris L. (cv. Stella) were grown in controlledconditions under three different irradiances of visible lightwith or without UV-B (280–320nm) radiation. The biologicallyeffective UV-B radiation (UV-BBE) was 6.17 kJ m–2 d–1,and simulated a c. 5% decrease in stratospheric ozone at 55.7?N,13.4?E. The photon flux densities of the photosyntheticallyactive radiation (PAR, 400–700 nm) were either 700 µmolm–2–1 (HL), 500, µmol m–2 s–1(ML) or 230 µmol m–2 s–1 PAR (LL). Under highlight (HL) conditions plus UV-B radiation, bean plants appearedmost resistant to the enhanced levels of UV-B radiation, andresponded only by increasing leaf thickness by c. 18%. A smallincrease in UV screening pigments was also observed. Both thelower irradiances (ML and LL) increased the sensitivity of theplants to UV-B radiation. Changes in leaf structure were alsoobserved. Photosystem II was inhibited under ML and LL togetherwith UV-B radiation, as determined by Chi fluorescence inductionand calculation of the fluorescence half-rise times. Leaf reflectivitymeasurements showed that the amount of PAR able to penetrateleaves of UV-B treated plants was reduced, and that a possiblecorrelation may exist between the reduced PAR levels, loss ofChi and lowered photosynthetic activity, especially for LL +UV-Bgrown plants, where surface reflection from leaves was highest.Changes in leaf chlorophyll content were mostly confined toplants grown under LL + UV-B, where a decrease of c. 20% wasfound. With regard to protective pigments (the carotenoids andUV screening pigments) plants subjected to different visiblelight conditions responded differently. Among the growth parametersmeasured, there was a substantial decrease in leaf area, particularlyunder LL + UV-B (c. 47% relative to controls), where leaf dryweight was also reduced by c. 25%. Key words: Chlorophyll fluorescence induction, bean, flavonoids, Phaseolus vulgaris, reflectance, UV-B radiation |
