联合固氮菌Alcaligen faecalislin泌铵突变体离子不选育及鉴定

Ｎ＾＋注入野生型菌株（Ａｌｃａｌｉｇｅｎ ｆａｅｃａｌｉｓ １．４８８），筛选出抗５１．６ｍｍｏｌ／Ｌ乙二胺的泌铵突变株ＥＭ１１０５，它以ＫＮＯ３为氮源时，培养２１ｈ泌铵量可达到１．１０ｍｍｏｌ／Ｌ。研究了该突变株在不同氮源下的培养特性，推断为铵载体缺陷型。     

离子注入对微生物细胞的刻蚀与对DNA的损伤及修复

以耐辐射异常球菌为试材,以E. coli 为对照,用显微扫描电镜和3H-TdR标记,研究了离子注入对微生物细胞的刻蚀与对DNA的损伤及其修复。结果表明,注入离子对细胞存在着刻蚀损伤;中性蔗糖梯度密度离心沉降分析证明, 大剂量下离子注入可直接导致DNA损伤,并观察到在对应的存活率峰值注入剂量下,D. radiodurans修复损伤DNA的能力比E. coli 强,还证明了细胞经不同时间温育后,损伤的DNA分子得到了部分修复。 Abstract：　The direct action of N+implantationin on D. radioduransand E. coliwas investigated by SEM, and their cells were labeled with 3H-TdR, which were implanted by 20keV N+after incubation 18hours, then the DNA of lysed cells was subjected to the neutral sucrose gradient(5%～20%) ultra-centrifugation sedimentation analysis. The results showed that N+implantation exerted direct action on two kinds of microorganisms; the momentum transfer and energy deposition of implantation ions produced the direct etching damage on cells, and repair DNA efficiency of D.radiodurans was higher than that of E. coli. Meanwhile, the damaged DNA incomplete repairing was observed. When incubation was continued up to 6 hours, the rejoined DNA molecules broke again. The repair of damaged DNA could be inhibited by 200μg/ml chloramphenicol. This suggested that DNA damage was serious by ion implantation and damaged DNA repair of cells need continuously synthesizing repair enzyme.     

联合固氮菌Alcaligen faecalis泌铵突变体离子束选育及鉴定

N+注入野生型菌株(Alcaligen faecalis 1.488),筛选出抗51.6mmol/L乙二胺的泌铵突变株EM1105,它以KNO3为氮源时,培养21h泌铵量可达到1.10mmol/L.研究了该突变株在不同氮源下的培养特性,推断为铵载体缺陷型.     

图位基因克隆

图位基因克隆是最近几十年中发展并逐步完善起来的基因分离及研究方法。紧密连锁分子标记的获得及ＤＮＡ大片段克隆文库的建立是顺利进行图位基因克隆的重要条件,而对于那些数量性状基因（ＱＴＬｓ）的克隆更显示了其优越性。     

离子注入对微生物细胞的刻蚀与对DNA的损伤及修复

以耐辐射异常球菌为试材,以E. coli 为对照,用显微扫描电镜和3H-TdR标记,研究了离子注入对微生物细胞的刻蚀与对DNA的损伤及其修复。结果表明,注入离子对细胞存在着刻蚀损伤;中性蔗糖梯度密度离心沉降分析证明, 大剂量下离子注入可直接导致DNA损伤,并观察到在对应的存活率峰值注入剂量下,D. radiodurans修复损伤DNA的能力比E. coli 强,还证明了细胞经不同时间温育后,损伤的DNA分子得到了部分修复。 Abstract：　The direct action of N+implantationin on D. radioduransand E. coliwas investigated by SEM, and their cells were labeled with 3H-TdR, which were implanted by 20keV N+after incubation 18hours, then the DNA of lysed cells was subjected to the neutral sucrose gradient(5%～20%) ultra-centrifugation sedimentation analysis. The results showed that N+implantation exerted direct action on two kinds of microorganisms; the momentum transfer and energy deposition of implantation ions produced the direct etching damage on cells, and repair DNA efficiency of D.radiodurans was higher than that of E. coli. Meanwhile, the damaged DNA incomplete repairing was observed. When incubation was continued up to 6 hours, the rejoined DNA molecules broke again. The repair of damaged DNA could be inhibited by 200μg/ml chloramphenicol. This suggested that DNA damage was serious by ion implantation and damaged DNA repair of cells need continuously synthesizing repair enzyme.